Prof. Dr. rer. nat. Thomas Wilhein
FB Mathematik und Technik, Hochschule Koblenz
- 02642/932-203
- 02642/932-399
Schäfer, David; Benk, Markus; Bergmann, Klaus et al.
Optical setup for tabletop soft X-ray microscopy using electrical discharge sourcesJournal of Physics : Conference Series. Bd. 186. H. 1. Bristol: IOP Publ. 2009 012033
Gutt, Christian; Stadler, Lorenz-M.; Streit-Nierobisch, Simone et al.
Resonant magnetic scattering with soft x-ray pulses from a free-electron laser operating at 1.59 nmPhysical review : B ; condensed matter and materials physics. Bd. 79. H. 21. College Park, MD: APS 2009 212406
Bertilson, Michael C.; von Hofsten, Olov; Lindblom, Magnus et al.
Compact high-resolution differential interference contrast soft x-ray microscopyApplied Physics Letters. Bd. 92. H. 6. Melville, N.Y.: AIP Publishing 2008 064104
Benk, Markus; Bergmann, Klaus; Schäfer, David et al.
Compact soft x-ray microscope using a gas discharge light sourceOptics Letters. Bd. 33. H. 20. Washington, DC. 2008 S. 2359 - 2361
Schäfer, David; Nisius, Thomas; Früke, Rolf et al.
Compact x-ray microscopes for EUV- and soft x-radiation with spectral imaging capabilitiesAdvances in X-Ray/EUV Optics, Components and Applications. Bd. 6317. Bellingham, Wash.: SPIE 2007 631704
Lindblom, Magnus; Tuohimaa, Tomi; Holmberg, Anders et al.
High-resolution differential interference contrast X-ray zone plates : design and fabricationSpectrochimica Acta, Part B : Atomic Spectroscopy. Bd. 62. H. 6-7. Amsterdam: Elsevier 2007 S. 539 - 543
Nisius, Thomas; Schäfer, David; Früke, Rolf et al.
Wavefront analysis and beam profiling from 40 eV up to 40 keVAdvances in X-Ray/EUV Optics, Components and Applications. Bd. 6317. Bellingham, Wash.: SPIE 2007 6317E
Vogt, Ulrich; Lindblom, Magnus; Charalambous, Pambos et al.
Condenser for Koehler-like illumination in transmission x-ray microscopes at undulator sourcesOptics Letters. Bd. 31. H. 10. Washington, DC: Soc. 2006 S. 1465 - 1467
Vogt, Ulrich; Wilhein, Thomas; Legall, Herbert et al.
High-Resolution X-Ray Absorption Spectroscopy Using a Laser Plasma Radiation SourceAoki, Sadao (Hrsg). Proceedings of the 8th International Conference on X-ray microscopy. Tokio: IPAP : Institute of Pure and Applied Physics 2006 S. 334 - 336
Vogt, Ulrich; Lindblom, Magnus; Jansson, Per A. C. et al.
Towards Soft X-Ray Phase-Sensitive Imaging with Diffractive Optical ElementsAoki, Sadao (Hrsg). Proceedings of the 8th International Conference on X-ray microscopy. Tokio: IPAP : Institute of Pure and Applied Physics 2006 S. 91 - 93
Wieland, Marek; Wilhein, Thomas; Spielmann, Christian et al.
Towards Table-Top Time-Resolved Soft X-Ray Microscopy Imaging With a Laboratory High-Harmonic Source at 100 eVAoki, Sadao (Hrsg). Proceedings of the 8th International Conference on X-ray microscopy. Tokio: IPAP : Institute of Pure and Applied Physics 2006 S. 369 - 371
Kaulich, Burkhard; Bacescu, Daniel; Susini, Jean et al.
TwinMic : a European Twin X-ray Microscopy Station Comissioned at ELETTRAAoki, Sadao (Hrsg). Proceedings of the 8th International Conference on X-ray microscopy. Tokio: IPAP : Institute of Pure and Applied Physics 2006 S. 22 - 25
Früke, Rolf; Kutzner, Jörg; Witting, Tobias et al.
EUV scanning transmission microscope operating with high-harmonic and laser plasma radiationepl : a letters journal exploring the frontiers of physics. Bd. 72. H. 6. Les Ulis: EDP Sciences 2005 S. 915 - 921
Di Fabrizio, Enzo; Cojoc, Dan; Cabrini, Stefano et al.
Phase and intensity control through diffractive optical elements in X-ray microscopyJournal of Electron Spectroscopy and Related Phenomena : the international journal on theoretical, experimental and applied aspects of electron spectroscopy. Bd. 144-147. New York [u.a.]: Elsevier 2005 S. 957 - 961
Vogt, Ulrich; Lindblom, Magnus; Jansson, Per A. C. et al.
Single optical element soft x-ray interferometer using a laser plasma x-ray sourceOptics Letters. Bd. 30. H. 16. Washington, DC: Soc. 2005 S. 2167 - 2169
Wieland, Marek; Spielmann, Christian; Westerwalbesloh, Thomas et al.
Toward time-resolved soft x-ray microscopy using pulsed fs-high-harmonic radiationUltramicroscopy. Bd. 102. H. 2. Amsterdam: Elsevier Science 2005 S. 93 - 100
Wieland, Marek; Wilhein, Thomas; Kleineberg, Ulf et al.
Applications of high-harmonic radiation for interferometry and spectroscopyKrausz, Ferenc (Hrsg). Ultrafast Optics IV. Berlin [u.a.]: Springer 2004 S. 467 - 474
Vogt, Ulrich; Wilhein, Thomas; Legall, Herbert et al.
High resolution x-ray absorption spectroscopy using a laser plasma radiation sourceReview of Scientific Instruments. Bd. 75. H. 11. Melville, NY: AIP 2004 S. 4606 - 4609
Vogt, Ulrich; Frueke, Rolf; Wilhein, Thomas et al.
High-resolution spatial characterization of laser produced plasmas at soft x-ray wavelengthsApplied Physics : B ; Lasers and optics. Bd. 78. H. 1. Berlin [u.a.]: Springer 2004 S. 53 - 58
Di Fabrizio, Enzo; Cojoc, Dan; Cabrini, Stefano et al.
Design and Fabrication of new optics for X-ray microscopy and material sciencesJournal de Physique IV : Proceedings. Bd. 104. H. 3. Les Ulis: EDP Sciences 2003 S. 177 - 183
Wilhein, Thomas; Kaulich, Burkhard; Di Fabrizio, Enzo et al.
Differential Interference Contrast X-ray Microscopy at ESRF Beamline ID 21Journal de Physique IV : Proceedings. Bd. 104. H. 3. Les Ulis: EDP Sciences 2003 S. 535 - 541
Di Fabrizio, Enzo; Cojoc, Dan; Cabrini, Stefano et al.
Diffractive optical elements for differential interference contrast x-ray microscopyOptics Express. Bd. 11. H. 19. Washington, DC: Soc. 2003 S. 2278 - 2288
Wieland, Marek; Früke, Rolf; Wilhein, Thomas et al.
Hohe Harmonische im EUV : Charakterisierung und erste AnwendungenBuzug, Thorsten M. (Hrsg). Physikalische Methoden der Laser- und Medizintechnik. Düsseldorf: VDI-Verl. 2003 S. 260 - 266
Früke, Rolf; Wilhein, Thomas; Wieland, Marek et al.
Imaging of a laser plasma source at 13 nm wavelength approaching submicrometer resolutionJournal de Physique IV : Proceedings. Bd. 104. H. 3. Les Ulis: EDP Sciences 2003 S. 153 - 156
Di Fabrizio, Enzo; Cojoc, Dan; Cabrini, Stefano et al.
Nano-optical elements fabricated by e-beam and x-ray lithographyProceedings of SPIE : Nano- and Micro-Optics for Information Systems. Bd. 5225. Bellingham, Wash.: SPIE 2003 S. 113 - 125
Buzug, Thorsten M.; Hartmann, Ulrich; Hülster, Anke et al.
Fortschrittberichte VDI. Physikalische Methoden der Laser- und MedizintechnikDüsseldorf: VDI-Verl. 2003 310 S. (Reihe 17 : Biotechnik, Medizintechnik ; 231)
Di Fabrizio, Enzo; Cabrini, Stefano; Cojoc, Dan et al.
Shaping X-rays by diffractive coded nano-opticsMicroelectronic Engineering : an international journal of semiconductor manufacturing technology. Bd. 67-68. H. 1. Amsterdam: Elsevier 2003 S. 87 - 95
Wieland, Marek; Früke, Rolf; Wilhein, Thomas et al.
Sub-micron imaging in the EUV-spectral range using high-harmonic radiationJournal de Physique IV : Proceedings. Bd. 104. H. 3. Les Ulis: EDP Sciences 2003 S. 149 - 152
Kaulich, Burkhard; Susini, Jean; David, Christian et al.
Twinmic : a European twin microscope station combining full-field imaging and scanning microscopyJournal de Physique IV : Proceedings. Bd. 104. H. 3. Les Ulis: EDP Sciences 2003 S. 103 - 107
Kaulich, Burkhard; Susini, Jean; David, Christian et al.
TwinMic : combined Scanning and Full-field Imaging Microscopy with Novel Contrast MechanismsSRN : Synchrotron Radiation News. Bd. 16. H. 3 : Special Issue " X‐ray Microscopy". Philadelphia, Pa.: Taylor & Francis 2003 S. 49 - 52
Wieland, Marek; Wilhein, Thomas; Spielmann, Christian et al.
Zone plate interferometry at 13 nm wavelengthApplied Physics : B ; Lasers and optics. Bd. 76. H. 8. Berlin [u.a.]: Springer 2003 S. 885 - 889
Wilhein, Thomas
A new powerful source for coherent VUV radiation : Demonstration of exponential growth and saturation at the TTF free-electron laserThe European physical Journal : D ; Atoms, molecules and clusters. Bd. 20. H. 1. Berlin [u.a.]: Springer 2002 S. 149 - 156
Di Fabrizio, Enzo; Kaulich, Burkhard; Wilhein, Thomas et al.
Differential Interference Contrast for X-Ray Microscopy : Fabrication and Characterization of Twin Zone Plate OpticsSurface Review and Letters : SRL. Bd. 9. H. 1. Singapore: World Scientific Publ. 2002 S. 243 - 248
Kaulich, Burkhard; Wilhein, Thomas; Di Fabrizio, Enzo et al.
Differential interference contrast x-ray microscopy with twin zone platesJournal of the Optical Society of America : JOSA ; A : Optics, image science and vision. Bd. 19. H. 4. Washington, DC: Soc. 2002 S. 797 - 806
Kaulich, Burkhard; Polack, Francois; Neuhaeuser, Ulrich et al.
Diffracting aperture based differential phase contrast for scanning X-ray microscopyOptics express : the international electronic journal of optics. Bd. 10. H. 20. Washington, DC: Soc. 2002 S. 1111 - 1117
Di Fabrizio, Enzo; Cabrini, Stefano; Cojoc, Dan et al.
Novel diffractive optics for x-ray beam shapingProceedings of SPIE : Design and Microfabrication of Novel X-Ray Optics. Bd. 4783. Bellingham, Wash.: SPIE 2002 S. 105 - 114
Wieland, Marek; Wilhein, Thomas; Frueke, Rolf et al.
Submicron Extreme Ultraviolet Imaging Using High-Harmonic RadiationApplied Physics Letters. Bd. 81. H. 14. Melville, NY: American Institute of Physics 2002 S. 2520 - 2522
Beck, Michael; Vogt, Ulrich; Will, Ingo et al.
A pulse-train laser driven XUV source for picosecond pump-probe experiments in the water windowOptics Communications. Bd. 190. H. 1-6. Amsterdam [u.a.]: Elsevier 2001 S. 317 - 326
Vogt, Ulrich; Wieland, Marek; Wilhein, Thomas et al.
Design and application of a zone plate monochromator for laboratory soft x-ray sourcesReview of Scientific Instruments : RSI. Bd. 72. H. 1. Melville, NY: AIP 2001 S. 53 - 57
Wilhein, Thomas; Kaulich, Burkhard; Di Fabrizio, Enzo et al.
Differential interference contrast x-ray microscopyProceedings of SPIE : Soft X-Ray and EUV Imaging Systems II. Bd. 4506. Bellingham, Wash.: SPIE 2001 S. 163 - 171
Wilhein, Thomas; Kaulich, Burkhard; Di Fabrizio, Enzo et al.
Differential interference contrast x-ray microscopy with submicron resolutionApplied Physics Letters. Bd. 78. H. 14. Melville, NY: AIP 2001 S. 2082 - 2084
Wieland, Marek; Wilhein, Thomas; Faubel, Manfred et al.
EUV and fast ion emission from cryogenic liquid jet target laser-generated plasmaApplied Physics : B ; Lasers and optics. Bd. 72. H. 5. Berlin [u.a.]: Springer 2001 S. 591 - 597
Vogt, Ulrich; Stiel, Holger; Will, Ingo et al.
Influence of laser intensity and pulse duration on the EUV-yield from a water jet target laser plasmaAppl. Phys. Lett. Bd. 79. H. 15. Melville, NY: AIP 2001 S. 2336 - 2338
Vogt, Ulrich; Stiel, Holger; Will, Ingo et al.
Liquid water jet laser plasma source for extreme ultraviolet lithographyDeutsche Physikalische Gesellschaft (Hrsg). Verhandlungen der Deutschen Physikalischen Gesellschaft. Bd. 2001. Berlin. 2001 36
Vogt, Ulrich; Stiel, Holger; Will, Ingo et al.
Scaling-up a liquid water jet laser plasma source to high average power for Extreme Ultraviolet LithographyProceedings of SPIE : Emerging Lithographic Technologies V. Bd. 4343. Bellingham, Wash.: SPIE 2001 S. 535 - 542
Wieland, Marek; Faubel, Manfred; Schmidt, Martin et al.
Soft X-ray and EUV emission from cryogenic liquid jets irradiated with fs, ps, and ns-laser pulsesProceedings of SPIE : Application of X-Rays Generated from Lasers and Other Bright Sources II. Bd. SPIE 4504. Bellingham, Wash.: SPIE 2001 S. 62 - 68
Wilhein, Thomas; Kaulich, Burkhard; Susini, Jean
Two zone plate interference contrast microscopy at 4 keV photon energyOptics Communications. Bd. 193. H. 1. Amsterdam [u.a.]: Elsevier 2001 S. 19 - 26
Berglund, Magnus; Rymell, Lars; Peuker, Markus et al.
Compact water-window transmission X-ray microscopyJournal of Microscopy. Bd. 197. H. 3. Oxford [u.a.]: Wiley-Blackwell 2000 S. 268 - 273
Hertz, Hans M.; Berglund, Magnus; Johansson, Goeran A. et al.
Compact water-window x-ray microscopy with a laser plasma droplet sourceMeyer-Ilse, Werner (Hrsg). X-ray Microscopy : Proceedings of the VI International Conference. Melville, NY: AIP 2000 S. 721 - 725 Vol. 507
Wieland, Marek; Vogt, Ulrich; Faubel, Manfred et al.
Development and Characterization of a Soft X-ray Source using Room Temperature and Cryogenic Liquid Jets as low Debris TargetMeyer-Ilse, Werner (Hrsg). AIP Conf. Proc. Melville, NY: AIP 2000 S. 726 - 730 Vol. 507