Univ.-Prof. Dr. Gerd Schönhense
Institut für Physik, Johannes Gutenberg-Universität Mainz
Staudinger Weg 7 , 55128 Mainz, Raum: 03-631
- 06131/39-23621
- 06131/39-23807
Lin, JQ; Maul, J; Weber, N et al.
Inspection of EUVL mask blank defects and patterned masks using EUV photoemission electron microscopyMICROELECTRONIC ENGINEERING. Bd. 85. H. 5-6. AMSTERDAM: ELSEVIER SCIENCE BV 2008 S. 922 - 924
Elmers, Hans-Joachim; Schönhense, Gerhard
Ferromagnetic resonance study of thin film antidot arrays : experiment and micromagnetic simulationsPhysical review : B. Bd. 75. H. 17. Ridge, NY: APS 2007 174429
Lin, JQ; Neuhaeusler, U; Slieh, J et al.
Actinic extreme ultraviolet lithography mask blank defect inspection by photoemission electron microscopyJOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. Bd. 24. H. 6. MELVILLE: A V S AMER INST PHYSICS 2006 S. 2631 - 2635