Nanostructured thin films via self-assembly of block copolymers
Advanced materials. Bd. 14. H. 21. Weinheim: Wiley-VCH Verl. 2002 S. 1579
Erscheinungsjahr: 2002
ISBN/ISSN: 0935-9648
Publikationstyp: Zeitschriftenaufsatz
Sprache: Englisch
| Geprüft: | Bibliothek |
Inhaltszusammenfassung
A rich variety of thin-film structures arises from the self-assembly of incompatible block co- and terpolymers (see inside cover). These regular supramolecular structures have critical dimensions in the 10-100 nm regime, and some exhibit high complexity and order. The Figure shows a tapping-mode SFM image of an SBS (polystyrene/polybutadiene block copolymer) film on a silicon substrate after annealing in chloroform vapor.
Autoren
Krausch, Georg (Autor)
Magerle, R. (Autor)
Klassifikation
DDC Sachgruppe:
Physik
