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Stability of thin polymer films on corrugated substrates

The European physical journal : E. Bd. 4. H. 1. Berlin: Springer 2001 S. 69 - 76

Erscheinungsjahr: 2001

ISBN/ISSN: 1292-895X ; 1292-8941

Publikationstyp: Zeitschriftenaufsatz

Sprache: Englisch

Doi/URN: 10.1007/s101890170144

Volltext über DOI/URN

Geprüft:Bibliothek

Inhaltszusammenfassung


We study the wetting behaviour of thin polystyrene (PS) films on regularly corrugated silicon substrates. Below a critical film thickness the PS films are unstable and dewet the substrates. The dewetting process leads to the formation of nanoscopic PS channels filling the grooves of the corrugated substrates. Films thicker than the critical thickness appear stable and follow the underlying corrugation pattern. The critical thickness is found to scale with the radius of gyration of the unpertu...We study the wetting behaviour of thin polystyrene (PS) films on regularly corrugated silicon substrates. Below a critical film thickness the PS films are unstable and dewet the substrates. The dewetting process leads to the formation of nanoscopic PS channels filling the grooves of the corrugated substrates. Films thicker than the critical thickness appear stable and follow the underlying corrugation pattern. The critical thickness is found to scale with the radius of gyration of the unperturbed polymer chains.» weiterlesen» einklappen

Autoren


Rehse, N. (Autor)
Wang, C. (Autor)
Hund, M. (Autor)
Geoghegan, M. (Autor)
Magerle, R. (Autor)
Krausch, Georg (Autor)

Klassifikation


DDC Sachgruppe:
Physik