Scanning near-field optical lithography
Thin solid films. Bd. 264. H. 2. Amsterdam: Elsevier 1995 S. 264 - 267
Erscheinungsjahr: 1995
ISBN/ISSN: 0040-6090
Publikationstyp: Zeitschriftenaufsatz
Sprache: Englisch
Doi/URN: 10.1016/0040-6090(95)05818-4
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Inhaltszusammenfassung
We discuss the influence of lateral fiber vibrations on the lateral resolution in scanning near field optical lithography using a tapered optical fiber. The fiber tip acts as a sub-wavelength sized light source to perform high-resolution photolithography in a commercial linear photoresist. After exposure and development, the structures are investigated by atomic force microscopy and a mechanical replica of the optical near field is revealed. We were able to create structures with lateral dime...We discuss the influence of lateral fiber vibrations on the lateral resolution in scanning near field optical lithography using a tapered optical fiber. The fiber tip acts as a sub-wavelength sized light source to perform high-resolution photolithography in a commercial linear photoresist. After exposure and development, the structures are investigated by atomic force microscopy and a mechanical replica of the optical near field is revealed. We were able to create structures with lateral dimensions below . The aspect ratio and the overall shape of the lines are found to depend on the lateral vibrations of the fiber tip needed to perform the shear-force distance measurement.» weiterlesen» einklappen
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Klassifikation
DDC Sachgruppe:
Physik