Starten Sie Ihre Suche...


Wir weisen darauf hin, dass wir technisch notwendige Cookies verwenden. Weitere Informationen

Scanning near-field optical lithography

Thin solid films. Bd. 264. H. 2. Amsterdam: Elsevier 1995 S. 264 - 267

Erscheinungsjahr: 1995

ISBN/ISSN: 0040-6090

Publikationstyp: Zeitschriftenaufsatz

Sprache: Englisch

Doi/URN: 10.1016/0040-6090(95)05818-4

Volltext über DOI/URN

Geprüft:Bibliothek

Inhaltszusammenfassung


We discuss the influence of lateral fiber vibrations on the lateral resolution in scanning near field optical lithography using a tapered optical fiber. The fiber tip acts as a sub-wavelength sized light source to perform high-resolution photolithography in a commercial linear photoresist. After exposure and development, the structures are investigated by atomic force microscopy and a mechanical replica of the optical near field is revealed. We were able to create structures with lateral dime...We discuss the influence of lateral fiber vibrations on the lateral resolution in scanning near field optical lithography using a tapered optical fiber. The fiber tip acts as a sub-wavelength sized light source to perform high-resolution photolithography in a commercial linear photoresist. After exposure and development, the structures are investigated by atomic force microscopy and a mechanical replica of the optical near field is revealed. We were able to create structures with lateral dimensions below . The aspect ratio and the overall shape of the lines are found to depend on the lateral vibrations of the fiber tip needed to perform the shear-force distance measurement.» weiterlesen» einklappen

Autoren


Wegscheider, S. (Autor)
Kirsch, A. (Autor)
Mlynek, J. (Autor)
Krausch, Georg (Autor)

Klassifikation


DDC Sachgruppe:
Physik